Mr. Zorian S. Masnyj Profile

Zorian S. Masnyj

Senior Process Engineer

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Author

Publications (5)

Proceedings Article | 27 December 2002 Paper

Image placement error due to pattern transfer for EUV masks

Zorian Masnyj, James Wasson, Bing Lu, Eric Weisbrod, Pawitter Mangat, Kevin Nordquist, Eric Ainley, William Dauksher, Douglas Resnick

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.477479

KEYWORDS: Photomasks, Extreme ultraviolet, Chromium, Distortion, Lithography, Extreme ultraviolet lithography, Etching, Image processing, Reticles, Semiconducting wafers

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Proceedings Article | 27 December 2002 Paper

Critical dimension and image placement issues for step and flash imprint lithography templates

Kevin Nordquist, David Mancini, William Dauksher, Eric Ainley, Kathleen Gehoski, Douglas Resnick, Zorian Masnyj, Pawitter Mangat

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467753

KEYWORDS: Quartz, Chromium, Distortion, Overlay metrology, Lithography, Image processing, Photomasks, Critical dimension metrology, Fabrication, Etching

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Proceedings Article | 20 August 2001 Paper

Evaluation of Shipley XP2040D positive chemically amplified resist for SCALPEL mask fabrication

Bing Lu, Zorian Masnyj, Pawitter Mangat, Kevin Nordquist, Eric Ainley, Douglas Resnick

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436703

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Mask making, Silicon, Line edge roughness, Photoresist processing, Chemically amplified resists, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 21 July 2000 Paper

Evaluation of negative DUV resist UVN30 for electron-beam exposure of NGL masks

Zorian Masnyj, Pawitter Mangat, Eric Ainley, Kevin Nordquist, Douglas Resnick

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390090

KEYWORDS: Critical dimension metrology, Photomasks, Line edge roughness, Mask making, Deep ultraviolet, Thin film coatings, Photoresist processing, Lithography, Semiconducting wafers, Manufacturing

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Proceedings Article | 30 December 1999 Paper

Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL)

Gregory Cardinale, John Goldsmith, Avijit Ray-Chaudhuri, Aaron Fisher, Scott Hector, Pawitter Mangat, Zorian Masnyj, David Mancini, Bill Wilkinson, Jeffrey Bokor, Seongtae Jeong, Scott Burkhart, Charles Cerjan, Christopher Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

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