PHOTOMASK JAPAN 2017
5-7 April 2017
Yokohama, Japan
Front Matter: Volume 10454
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045401 (2017) https://doi.org/10.1117/12.2285890
FPD Photomasks I: Equipment Tools and Pellicle
Shinobu Ohara, Akinori Yoshida, Mitsuo Hirai, Takenori Kato, Koichi Moriizumi, Haruhiko Kusunose
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045402 (2017) https://doi.org/10.1117/12.2284332
Kimiyuki Maruyama, Sadayuki Hirayama, Kohei Yano, Takashi Fujikawa, Masakatsu Hirano, Tatsunori Nakahara, Yuji Maruyama, Noriko Tani
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045403 (2017) https://doi.org/10.1117/12.2279552
FPD Photomasks II: Material and Process
Nobuhisa Imashiki, Yutaka Yoshikawa, Michihiko Hayase
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045404 (2017) https://doi.org/10.1117/12.2278689
Youkou Ishitsuka, Daijitsu Harada, Atsushi Watabe, Masaki Takeuchi
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045405 (2017) https://doi.org/10.1117/12.2278704
Use of GPU in Mask Making I
Toru Baji
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045406 (2017) https://doi.org/10.1117/12.2279088
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045407 (2017) https://doi.org/10.1117/12.2281110
Ryan Pearman, Harold Zable, Aki Fujimura
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045408 (2017) https://doi.org/10.1117/12.2282784
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045409 (2017) https://doi.org/10.1117/12.2280841
Use of GPU in Mask Making II
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540A (2017) https://doi.org/10.1117/12.2279410
Noriaki Nakayamada, Rieko Nishimura, Satoru Miura, Haruyuki Nomura, Takashi Kamikubo
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540B (2017) https://doi.org/10.1117/12.2282841
Harold Zable, Tom Kronmiller, Ryan Pearman, Bill Guthrie, Nagesh Shirali, Yukihiro Masuda, Takashi Kamikubo, Noriaki Nakayamada, Aki Fujimura
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540C (2017) https://doi.org/10.1117/12.2282030
Harold Zable, Hironobu Matsumoto, Kenichi Yasui, Ryosuke Ueba, Noriaki Nakayamada, Nagesh Shirali, Yukihiro Masuda, Ryan Pearman, Aki Fujimura
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540D (2017) https://doi.org/10.1117/12.2281922
Writing Technologies
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540E (2017) https://doi.org/10.1117/12.2283033
EDA & MDP
Jian-Cheng Chen, Min-Ying Lu, Xiang Fang, Ming-Feng Shen, Shou-Yuan Ma, Chuen-Huei Yang, Joe Tsai, Rachel Lee, Erwin Deng, et al.
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540G (2017) https://doi.org/10.1117/12.2278691
Sébastien Bayle, Charles Tiphine, Matthieu Milléquant, Thiago Figueiro, Luc Martin, Sergei Postnikov, Patrick Schiavone
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540H (2017) https://doi.org/10.1117/12.2280704
Lithography Related Technologies
Process
Olga Hortenbach, Haiko Rolff, Alexander Lajn, Martin Baessler
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540K (2017) https://doi.org/10.1117/12.2277708
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540L (2017) https://doi.org/10.1117/12.2278718
EUV Masks I
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540M (2017) https://doi.org/10.1117/12.2282761
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540N (2017) https://doi.org/10.1117/12.2280133
EUV Masks II
Norbert Koster, Edwin te Sligte, Alex Deutz, Freek Molkenboer, Pim Muilwijk, Peter van der Walle, Wouter Mulckhuyse, Bjorn Nijland, Peter Kerkhof, et al.
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540O (2017) https://doi.org/10.1117/12.2279025
EUV Masks III
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540P (2017) https://doi.org/10.1117/12.2278726
NIL
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540Q (2017) https://doi.org/10.1117/12.2280685
Masami Yonekawa, Takahiro Nakayama, Kazuki Nakagawa, Toshihiro Maeda, Yoichi Matsuoka, Keiji Emoto, Hisanobu Azuma, Yukio Takabayashi, Ali Aghili, et al.
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540R (2017) https://doi.org/10.1117/12.2279365
Poster Session: Materials of and for Photomasks
Noriyuki Harashima, Tatsuya Isozaki, Arata Kawanishi, Shuichiro Kanai, Kagehiro Kageyama, Hiroyuki Iso, Tatsuya Chishima
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540S (2017) https://doi.org/10.1117/12.2282803
Poster Session: Process
Yuan Hsu, Hong-Jen Lee
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540T (2017) https://doi.org/10.1117/12.2275540
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540U (2017) https://doi.org/10.1117/12.2277685
Poster Session: Metrology Tools and Technologies
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540V (2017) https://doi.org/10.1117/12.2279676
Jumpei Fukui, Yusaku Tachibana, Makoto Osanai
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540W (2017) https://doi.org/10.1117/12.2278840
Poster Session: Repairing Tools and Technologies
Kristian Schulz, Kokila Egodage, Gilles Tabbone, Anthony Garetto
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540X (2017) https://doi.org/10.1117/12.2282804
Poster Session: NIL
Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540Y (2017) https://doi.org/10.1117/12.2280686
Poster Session: FPD Photomasks Material and Process
Jin-Han Song, Jin-Woong Jeong, Kyu-Sik Kim, Woo-Gun Jeong, Sang-Pil Yun, Dong-Heok Lee, Sang-Soo Choi
Proceedings Volume Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540Z (2017) https://doi.org/10.1117/12.2278714
Poster Session: Mask/Lithography Related Technologies in Academia
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