An investigation on the process control for the solid application of EUV MOR

Sangjin Kim; Il-Hwan Kim; Hyungju Ryu; Yongbeom Seo; Yigwon Kim; Jinhee Jang; Tae-Min Choi; Sol Jeong; Yongchul Jeong; Kyoungyong Cho; Cheolin Jang; Kyeongbeom Park; Changmin Park

doi:10.1117/12.2658345

28 April 2023 An investigation on the process control for the solid application of EUV MOR

Sangjin Kim, Il-Hwan Kim, Hyungju Ryu, Yongbeom Seo, Yigwon Kim, Jinhee Jang, Tae-Min Choi, Sol Jeong, Yongchul Jeong, Kyoungyong Cho, Cheolin Jang, Kyeongbeom Park, Changmin Park

Author Affiliations +

Proceedings Volume 12494, Optical and EUV Nanolithography XXXVI; 124940V (2023) https://doi.org/10.1117/12.2658345
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Metal oxide resists (MORs) have been becoming one of the most promising candidates that facilitates the extension of EUV single exposure by improving both lithographic resolution and etch selectivity. However, to succeed high volume manufacturing, the MORs process should be robust and persistent regardless of lithographic process fluctuation that might occur. In this work, the systematic examinations on the MORs process have been explored in order to understand the MORs patterning mechanism. We found that the ADI CD (After Development Inspection Critical Dimension) could be varied with trivial fluctuation of EUV radiation, humidity, and incomplete condensation reaction. In particular, the humidity around a coated resist was the important element that affected the condensation reaction and determined the insolubility of MORs against developer solution, which consequently defines the ADI CD. Thus, the methods that enable not only the moisture control but the sufficient condensation reaction were carefully examined. Moreover, it is investigated whether MORs can enhance further the etch selectivity while reducing the intrinsic resist defect. Several strategies have been implemented, which allow the CD variation to be reduced and the process window to be enlarged compared to the early stage MORs processes.

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Sangjin Kim, Il-Hwan Kim, Hyungju Ryu, Yongbeom Seo, Yigwon Kim, Jinhee Jang, Tae-Min Choi, Sol Jeong, Yongchul Jeong, Kyoungyong Cho, Cheolin Jang, Kyeongbeom Park, and Changmin Park "An investigation on the process control for the solid application of EUV MOR", Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI, 124940V (28 April 2023); https://doi.org/10.1117/12.2658345

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