Dr. George A. Antonelli
Vice President of R&D
SPIE Involvement:
Author
Publications (13)

SPIE Journal Paper | 6 November 2024 Open Access
Ezra Pasikatan, George Antonelli, Nick Keller, Subhadeep Kal, Matthew Rednor, Kandabara Tapily, Dave Hetzer, Mark Schaefer, Markus Kuhn, Satoshi Murakami, Alain Diebold
JM3, Vol. 23, Issue 04, 044004, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.044004
KEYWORDS: Silicon, Superlattices, Germanium, Etching, Film thickness, Nondestructive evaluation, Silicon nitride, Scanning transmission electron microscopy, Scatterometry, Data modeling

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12955, 129550Z (2024) https://doi.org/10.1117/12.3010409
KEYWORDS: Diffraction gratings, X-rays, Semiconducting wafers, X-ray diffraction, Metrology, Fabrication, Etching, Spectrometers, Spectral resolution, Reflection

Proceedings Article | 10 April 2024 Presentation + Paper
Nick Keller, Marc Poulingue, Ross Grynko, Troy Ribaudo, G. Andrew Antonelli, Victor Li, Marcello Ravasio, Delphine Le Cunff
Proceedings Volume 12955, 1295514 (2024) https://doi.org/10.1117/12.3010926
KEYWORDS: Simulations, Semiconducting wafers, Metrology, Nondestructive evaluation, Etching, Process control, Scatterometry

Proceedings Article | 10 April 2024 Presentation + Paper
Ezra Pasikatan, G. Andrew Antonelli, Nicholas Keller, Subhadeep Kal, Matthew Rednor, Markus Kuhn, Satoshi Murakami, Alain Diebold
Proceedings Volume 12955, 129550K (2024) https://doi.org/10.1117/12.3010523
KEYWORDS: Etching, Silicon, Superlattices, Scatterometry, Film thickness, Germanium, Scanning transmission electron microscopy, Mueller matrices, X-ray diffraction, Metrology

Proceedings Article | 27 April 2023 Presentation + Paper
Nick Keller, Zhuo Chen, Peter Wang, Rostislav Grynko, Troy Ribaudo, G. Andrew Antonelli, Youcheng Wang, Joshua Frederick, Sadao Takabayashi, John Hauck, Dan Engelhard
Proceedings Volume 12496, 124961Z (2023) https://doi.org/10.1117/12.2657719
KEYWORDS: Simulations, Metals, Finite-difference time-domain method, 3D acquisition, 3D metrology, Semiconducting wafers, Etching, Electric fields, Dielectrics, Plasmonics

Proceedings Article | 27 April 2023 Poster + Presentation + Paper
Colin Wadsworth, Ezra Pasikatan, Nicholas Keller, Andrew Antonelli, Alain Diebold
Proceedings Volume 12496, 1249619 (2023) https://doi.org/10.1117/12.2657690
KEYWORDS: Nanowires, Amorphous silicon, Silicon, Mueller matrices, Silica, Gallium arsenide, Etching, Transistors, Critical dimension metrology, Matrices

Proceedings Article | 26 May 2022 Presentation + Paper
Manjusha Mehendale, Andy Antonelli, Robin Mair, Priya Mukundhan, Janusz Bogdanowicz, Victor Blanco, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 1205313 (2022) https://doi.org/10.1117/12.2614295
KEYWORDS: Acoustics, Optical alignment, Ruthenium, Picosecond phenomena, Microscopy, Principal component analysis, Raster graphics, Metals

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530T (2022) https://doi.org/10.1117/12.2618035
KEYWORDS: Silicon, Etching, Metrology, Semiconducting wafers, Mid-IR, Diffractive optical elements, Silica, Scattering, Critical dimension metrology, Absorption

SPIE Journal Paper | 4 April 2022
JM3, Vol. 21, Issue 02, 021205, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021205
KEYWORDS: Mid-IR, Etching, Critical dimension metrology, Silicon, Spectroscopy, Finite-difference time-domain method, Superlattices, Absorption, Refractive index, Polarization

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111S (2021) https://doi.org/10.1117/12.2584751
KEYWORDS: Scatterometry, Field effect transistors, Metrology, Process control, Nanowires, Spectroscopic ellipsometry, Optical lithography, Inspection, Etching, Semiconducting wafers

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111O (2021) https://doi.org/10.1117/12.2583786

Proceedings Article | 11 October 2012 Paper
Sean King, George Antonelli, Gheorghe Stan, Robert Cook, R. Sooryakumar
Proceedings Volume 8466, 84660A (2012) https://doi.org/10.1117/12.930482
KEYWORDS: Dielectrics, Thin films, Metrology, Light scattering, Scattering, Acoustics, Semiconductors, Metals, Standards development, Atomic force microscopy

Proceedings Article | 17 March 2012 Paper
J. Shohet, H. Ren, M. Nichols, H. Sinha, W. Lu, K. Mavrakakis, Q. Lin, N. Russell, M. Tomoyasu, G. Antonelli, S. Engelmann, N. Fuller, V. Ryan, Y. Nishi
Proceedings Volume 8328, 83280I (2012) https://doi.org/10.1117/12.917967
KEYWORDS: Plasma, Dielectrics, Ions, Vacuum ultraviolet, Ultraviolet radiation, Synchrotrons, Silicon, Nitrogen, Oxygen, Plasma systems

Showing 5 of 13 publications
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