Dr. Hideaki Tsubaki
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 27 March 2017 Presentation + Paper
Michihiro Shirakawa, Hideaki Tsubaki, Hajime Furutani, Wataru Nihashi, Naohiro Tango, Kazuhiro Marumo, Kei Yamamoto, Hidenori Takahashi, Akiyoshi Goto, Mitsuhiro Fujita
Proceedings Volume 10146, 101460E (2017) https://doi.org/10.1117/12.2257956
KEYWORDS: Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Image processing, Immersion lithography, Chemically amplified resists, High volume manufacturing, Photomasks, Scanners, Polymers, Research management, Semiconducting wafers, Fluorine, Coating

Proceedings Article | 18 March 2016 Paper
Hideaki Tsubaki, Wataru Nihashi, Toru Tsuchihashi, Kei Yamamoto, Takahiro Goto
Proceedings Volume 9776, 977608 (2016) https://doi.org/10.1117/12.2218761
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Bridges, Extreme ultraviolet, Chemically amplified resists, Lithography, Line width roughness, Image resolution, Polymers, Mechanics, Absorption, Photoresist processing, Diffusion, Electroluminescence

Proceedings Article | 13 March 2015 Paper
Hideaki Tsubaki, Wataru Nihashi, Toru Tsuchihashi, Toru Fujimori, Makoto Momota, Takahiro Goto
Proceedings Volume 9422, 94220N (2015) https://doi.org/10.1117/12.2085696
KEYWORDS: Extreme ultraviolet lithography, Polymers, Photoresist materials, Photoresist developing, Bridges, Optical lithography, Lithography, Extreme ultraviolet, Capillaries, Digital signal processing

Proceedings Article | 17 April 2014 Paper
Hideaki Tsubaki, Shinji Tarutani, Toru Fujimori, Hiroo Takizawa, Takahiro Goto
Proceedings Volume 9048, 90481E (2014) https://doi.org/10.1117/12.2046205
KEYWORDS: Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Line width roughness, Lithography, Diffusion, Optical lithography, Absorption, Surface roughness, Photoresist processing

Proceedings Article | 1 April 2013 Paper
Hideaki Tsubaki, Shinji Tarutani, Naoki Inoue, Hiroo Takizawa, Takahiro Goto
Proceedings Volume 8679, 867905 (2013) https://doi.org/10.1117/12.2011357
KEYWORDS: Diffusion, Extreme ultraviolet lithography, Polymers, Line width roughness, Extreme ultraviolet, Contamination, Electron beam lithography, Semiconducting wafers, Lithography, Scanning electron microscopy

Proceedings Article | 29 March 2013 Paper
Proceedings Volume 8682, 868217 (2013) https://doi.org/10.1117/12.2011386
KEYWORDS: Line width roughness, Polymers, Amplifiers, Diffusion, Line edge roughness, Extreme ultraviolet, Semiconducting wafers, Photoresist processing, Extreme ultraviolet lithography, Molecules

Proceedings Article | 8 March 2012 Paper
Hideaki Tsubaki, Shinji Tarutani, Hiroo Takizawa, Takahiro Goto
Proceedings Volume 8325, 832509 (2012) https://doi.org/10.1117/12.916378
KEYWORDS: Polymers, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Line width roughness, Electron beam lithography, Capillaries, Lithography, Research management, Diffusion

Proceedings Article | 16 April 2011 Paper
Hiroshi Tamaoki, Shinji Tarutani, Hideaki Tsubaki, Toshiya Takahashi, Naoki Inoue, Tooru Tsuchihashi, Hiroo Takizawa, Hidenori Takahashi
Proceedings Volume 7972, 79720A (2011) https://doi.org/10.1117/12.879394
KEYWORDS: Polymers, Diffusion, Line width roughness, Extreme ultraviolet lithography, Lithography, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet, Polymer thin films, Research management

Proceedings Article | 8 April 2011 Paper
I. Pollentier, I. Neira, A.-M. Goethals, R. Gronheid, S. Tarutani, H. Tamaoki, H. Tsubaki, T. Takahashi
Proceedings Volume 7969, 79692L (2011) https://doi.org/10.1117/12.881214
KEYWORDS: Contamination, Polymers, Medium wave, Extreme ultraviolet lithography, Extreme ultraviolet, EUV optics, Photoresist materials, Resist chemistry, Chemistry, Semiconducting wafers

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76391O (2010) https://doi.org/10.1117/12.846033
KEYWORDS: Polymers, Diffusion, Lithography, Line width roughness, Semiconducting wafers, Polymer thin films, Extreme ultraviolet lithography, Research management, Optical lithography, Photoresist processing

Proceedings Article | 30 March 2010 Paper
Proceedings Volume 7639, 763909 (2010) https://doi.org/10.1117/12.846031
KEYWORDS: Polymers, Diffusion, Extreme ultraviolet, Absorption, Ionization, Electroluminescence, Extreme ultraviolet lithography, Yield improvement, Semiconducting wafers, Research management

Proceedings Article | 1 April 2009 Paper
Robert Sulc, James Blackwell, Todd Younkin, E. Steve Putna, Katherine Esswein, Antonio DiPasquale, Ryan Callahan, Hideaki Tsubaki, Tooru Tsuchihashi
Proceedings Volume 7273, 72733R (2009) https://doi.org/10.1117/12.814279
KEYWORDS: Extreme ultraviolet lithography, Lithography, Photoresist materials, Extreme ultraviolet, Optical lithography, Line width roughness, Molecules, Ionization, Semiconducting wafers, Lithium

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733S (2009) https://doi.org/10.1117/12.812204
KEYWORDS: Polymers, Line width roughness, Diffusion, Extreme ultraviolet lithography, Photomasks, Electroluminescence, Semiconducting wafers, Glasses, Extreme ultraviolet, Image resolution

Proceedings Article | 1 April 2009 Paper
Hideaki Tsubaki, Tooru Tsuchihashi, Katsuhiro Yamashita, Tomotaka Tsuchimura
Proceedings Volume 7273, 72733P (2009) https://doi.org/10.1117/12.814086
KEYWORDS: Polymers, Extreme ultraviolet lithography, Yield improvement, Extreme ultraviolet, Ionization, Line width roughness, Semiconducting wafers, Electrodes, Absorption, Chemically amplified resists

Proceedings Article | 1 April 2009 Paper
Hideaki Tsubaki, Tooru Tsuchihashi, Tomotaka Tsuchimura
Proceedings Volume 7273, 72731K (2009) https://doi.org/10.1117/12.814067
KEYWORDS: Diffusion, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Polymers, Electroluminescence, Semiconducting wafers, Electron beam lithography, Lithography, Extreme ultraviolet

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72730C (2009) https://doi.org/10.1117/12.814093
KEYWORDS: Line width roughness, Photoresist processing, Image processing, Double patterning technology, Photomasks, Semiconducting wafers, Particles, Polymers, Lithography, Materials processing

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69230F (2008) https://doi.org/10.1117/12.771773
KEYWORDS: Polymers, Photoresist processing, Image processing, Double patterning technology, Line width roughness, Photomasks, Polymer thin films, Optical lithography, Second-harmonic generation, Etching

Proceedings Article | 22 March 2007 Paper
Hideaki Tsubaki, Tsukasa Yamanaka, Fumiyuki Nishiyama, Koji Shitabatake
Proceedings Volume 6519, 651918 (2007) https://doi.org/10.1117/12.712157
KEYWORDS: Line width roughness, Polymers, Surface roughness, Radium, Polymer thin films, Nanoimprint lithography, Image processing, Diffusion, Lithography, Semiconducting wafers

Showing 5 of 18 publications
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