Dr. Jaeyoung Choi
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 23 March 2011 Paper
Yeon-Ah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, Ki-Ho Baik
Proceedings Volume 7973, 79732S (2011) https://doi.org/10.1117/12.870704
KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Overlay metrology, Logic

Proceedings Article | 23 March 2011 Paper
Youngmi Kim, Jae-Young Choi, Kwangseon Choi, Jung-Hoe Choi, Sooryong Lee
Proceedings Volume 7973, 79732T (2011) https://doi.org/10.1117/12.870707
KEYWORDS: Etching, Metals, Optical proximity correction, Error analysis, Resolution enhancement technologies, Bridges, Photomasks, Model-based design, Head, Logic devices

Proceedings Article | 27 May 2010 Paper
Sungho Jun, Yeon-Ah Shim, Jaeyoung Choi, Kwangsun Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, KiHo Baik
Proceedings Volume 7748, 77481V (2010) https://doi.org/10.1117/12.868563
KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Resolution enhancement technologies, Lithographic illumination, Scanners, Computer simulations

Proceedings Article | 23 September 2009 Paper
Jaeyoung Choi, Yeonah Shim, Kyunghee Yun, Kwangseon Choi, Jaewon Han
Proceedings Volume 7488, 74883K (2009) https://doi.org/10.1117/12.833463
KEYWORDS: Design for manufacturing, Optical proximity correction, Semiconducting wafers, Transistors, Scanning electron microscopy, Semiconductors, Metals, Resolution enhancement technologies, Photomask technology, Current controlled current source

Proceedings Article | 23 September 2009 Paper
Yeonah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Thomas Cecil, David Kim, KiHo Baik
Proceedings Volume 7488, 748837 (2009) https://doi.org/10.1117/12.833499
KEYWORDS: Lithography, SRAF, Photomasks, Optical lithography, Image processing, Lithographic illumination, Optical proximity correction, Resolution enhancement technologies, Scanners, Computer simulations

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727423 (2009) https://doi.org/10.1117/12.814153
KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Lithography, Semiconducting wafers, Scanning electron microscopy, Photomasks, Image processing, Critical dimension metrology

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71220X (2008) https://doi.org/10.1117/12.801557
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Chromium, Optical proximity correction, Optical simulations, Resolution enhancement technologies, Binary data, Electrons, Optical lithography

Proceedings Article | 17 October 2008 Paper
Hyesung Lee, Yeon-Ah Shim, Jae-Young Choi, Kwang-Seon Choi, Joanne Wu, Bo Su, Xinwei Zhou, Kenny Kim
Proceedings Volume 7122, 712221 (2008) https://doi.org/10.1117/12.801421
KEYWORDS: Optical proximity correction, Design for manufacturing, Nanoimprint lithography, Design for manufacturability, Semiconducting wafers, Lithography, Silicon, Wafer manufacturing, Yield improvement, Manufacturing

Proceedings Article | 17 October 2008 Paper
Jae-Hyun Kang, Jae-Young Choi, Yeon-Ah Shim, Hye-Sung Lee, Bo Su, Walter Chan, Ping Zhang, Joanne Wu, Keun-Young Kim
Proceedings Volume 7122, 71221N (2008) https://doi.org/10.1117/12.801312
KEYWORDS: Optical proximity correction, Design for manufacturing, Lithography, Scanning electron microscopy, Detection and tracking algorithms, Databases, Bridges, Model-based design, Fuzzy logic, Defect detection

Proceedings Article | 1 April 2008 Paper
Hyesung Lee, Jaeyoung Choi, Jeahee Kim, Jaewon Han, Keun-Young Kim
Proceedings Volume 6924, 69244B (2008) https://doi.org/10.1117/12.773017
KEYWORDS: Nanoimprint lithography, Resolution enhancement technologies, Optical lithography, Photomasks, Critical dimension metrology, Diffractive optical elements, SRAF, Photoresist processing, Lithography, Optical proximity correction

Proceedings Article | 1 April 2008 Paper
Yeonah Shim, Jaeyoung Choi, Jeahee Kim, Bo Su, Ping Zhang, Keun-Young Kim
Proceedings Volume 6925, 692513 (2008) https://doi.org/10.1117/12.772409
KEYWORDS: Optical proximity correction, Design for manufacturing, Lithography, Semiconducting wafers, Data processing, Semiconductors, Failure analysis, Integrated circuit design, Design for manufacturability, Manufacturing

Proceedings Article | 1 April 2008 Paper
Jae-Young Choi, Yeon-Ah Shim, Kyung-Hee Yun, Jong-Doo Kim, Jae-Hee Kim, Jae-Won Han
Proceedings Volume 6924, 69243L (2008) https://doi.org/10.1117/12.773092
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Semiconducting wafers, Photomasks, Error analysis, Lithography, Scattering, Glasses, Metals

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 692442 (2008) https://doi.org/10.1117/12.772454
KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Data modeling, Light scattering, Photomasks, Lens design, Manufacturing, Lithography, Optimization (mathematics)

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69243J (2008) https://doi.org/10.1117/12.773026
KEYWORDS: Data modeling, Reticles, Optical proximity correction, Critical dimension metrology, Calibration, Cadmium, Databases, Statistical modeling, Semiconducting wafers, Photomasks

Proceedings Article | 27 March 2007 Paper
Jaeyoung Choi, Jaehyun Kang, Yeonah Shim, Kyunghee Yun, Jiho Hong, Yongseok Lee, Keeho Kim
Proceedings Volume 6520, 652047 (2007) https://doi.org/10.1117/12.712001
KEYWORDS: Data modeling, Optical proximity correction, Data conversion, Process modeling, Critical dimension metrology, Reactive ion etching, Scanning electron microscopy, Photomasks, Etching, Image processing

Proceedings Article | 20 October 2006 Paper
Jaeyoung Choi, Jaehyun Kang, Yeonah Shim, Kyunghee Yun, Junseok Lee, Yongseok Lee, Keeho Kim
Proceedings Volume 6349, 63494O (2006) https://doi.org/10.1117/12.686653
KEYWORDS: Data modeling, Optical proximity correction, Statistical modeling, Critical dimension metrology, Process modeling, Lithography, Scanners, Photoresist materials, Photoresist processing, Optimization (mathematics)

Proceedings Article | 20 October 2006 Paper
Munhoe Do, Jaehyun Kang, Jaeyoung Choi, Junseok Lee, Yongsuk Lee, Keeho Kim
Proceedings Volume 6349, 63494P (2006) https://doi.org/10.1117/12.686655
KEYWORDS: Optical proximity correction, Logic, Databases, System on a chip, Data modeling, Photomasks, Instrument modeling, Manufacturing, Electronics, Distortion

Proceedings Article | 20 May 2006 Paper
Se-Jin Park, Kyung-Hee Yoon, Jae-Hyun Kang, Jae-Young Choi, Yong-Suk Lee, Keeho Kim
Proceedings Volume 6283, 62831K (2006) https://doi.org/10.1117/12.681745
KEYWORDS: Photomasks, Semiconducting wafers, Deep ultraviolet, Lithography, Laser systems engineering, Electron beam lithography, Critical dimension metrology, Scanners, Back end of line, Data modeling

Proceedings Article | 20 March 2006 Paper
Jae-Hyun Kang, Jae-Young Choi, Kyung-Hee Yun, Munho Do, Yong-Suk Lee, Keeho Kim
Proceedings Volume 6154, 61543J (2006) https://doi.org/10.1117/12.657050
KEYWORDS: Optical proximity correction, Process modeling, Critical dimension metrology, Photomasks, Bridges, Lithography, Semiconducting wafers, Failure analysis, Data modeling, Scanning electron microscopy

Proceedings Article | 20 March 2006 Paper
Se-Jin Park, Yeon-Ah Shim, Jae-Hyun Kang, Jae-Young Choi, Kyung-Hee Yoon, Yong-Suk Lee, Keeho Kim
Proceedings Volume 6154, 61543K (2006) https://doi.org/10.1117/12.657036
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Electroluminescence, Critical dimension metrology, Lithography, Data modeling, Error analysis, Logic, Etching

Showing 5 of 20 publications
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