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Janez Krek
at KLA Corporation
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Author
Publications (2)
Proceedings Article | 13 November 2024 Presentation
Nanometer-to-millimeter scale computational lithography for the study, detection, classification, repair, and reduction of stochastic defects in EUVL
John Biafore, Mark Smith, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Craig Higgins, Kunlun Bai, Trey Graves, Yi Liu, Janez Krek, Sergei Bakarian, Kyeongeun Ko, Chi-Ping Liu, Alex Arkhipov, Roel Gronheid, Kaushik Sah, Loemba Bouckou, Andrew Cross, Vikram Tolani, Ady Levy
Proceedings Volume PC13215, PC1321509 (2024) https://doi.org/10.1117/12.3034555
KEYWORDS: Extreme ultraviolet lithography, Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Metrology, Printing
Proceedings Article | 21 November 2023 Presentation + Paper
Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son
Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373
KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena
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