Dr. Xindong Gao Profile

Dr. Xindong Gao

at KLA China

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Author

Publications (5)

Proceedings Article | 26 May 2022 Poster + Paper

Process optimization by virtual target design in overlay metrology

Xiaolei Liu, Yoav Grauer, Raviv Yohanan, Mark Ghinovker, Diana Shaphirov, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Xindong Gao

Proceedings Volume 12053, 1205322 (2022) https://doi.org/10.1117/12.2614129

KEYWORDS: Metrology, Overlay metrology, Semiconducting wafers, Tolerancing, Device simulation, Calibration, Photomasks, Virtual reality, Opacity, Roads

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Proceedings Article | 20 March 2020 Paper

Improved device overlay by litho aberration tracking with novel target design for DRAM

Xiaolei Liu, Eitan Hajaj, Alon Volfman, Hedvi Spielberg, Yoav Grauer, Raviv Yohanan, Xindong Gao

Proceedings Volume 11325, 113252R (2020) https://doi.org/10.1117/12.2551990

KEYWORDS: Overlay metrology, Lithographic illumination, Optical proximity correction, Diffraction gratings

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Proceedings Article | 26 March 2019 Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

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Proceedings Article | 26 March 2019 Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

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Proceedings Article | 24 March 2016 Paper

Accuracy in optical overlay metrology

Barak Bringoltz, Tal Marciano, Tal Yaziv, Yaron DeLeeuw, Dana Klein, Yoel Feler, Ido Adam, Evgeni Gurevich, Noga Sella, Ze'ev Lindenfeld, Tom Leviant, Lilach Saltoun, Eltsafon Ashwal, Dror Alumot, Yuval Lamhot, Xindong Gao, James Manka, Bryan Chen, Mark Wagner

Proceedings Volume 9778, 97781H (2016) https://doi.org/10.1117/12.2219176

KEYWORDS: Overlay metrology, Scatterometry, Process control, Optical metrology, Metrology, Image processing, Optics manufacturing, Semiconductor manufacturing, Semiconductors, Manufacturing, Accuracy assessment, Optical alignment, Signal processing, Semiconducting wafers, Diffraction, Neodymium, Physics

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