Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo; Tomonori Motohashi; Nobuo Shimazu; Hiroyuki Nakano; Shinji Omori; Tetsuya Kitagawa; Shigeru Moriya

doi:10.1117/12.504067

28 August 2003 Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo, Tomonori Motohashi, Nobuo Shimazu, Hiroyuki Nakano, Shinji Omori, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504067
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

The placement-error correction for low-energy electron-beam proximity-projection lithography (LEEPL) has been demonstrated to enable the overlay accuracy of 23 nm that meets the requirement for the 65-nm node. The overlay accuracy for LEEPL-ArF mix-and-match lithography has been analyzed, focusing separately on the intra-field error, the inter-field error, and the dynamic fluctuation over different wafers. It has been found that the intra-field error, mainly due to the distortion of a 1x stencil mask, can be effectively corrected for by using the fine deflection of the electron beam, a unique capability of the LEEPL exposure equipment. In addition, the inter-field error can be suppressed by correcting in real time for the magnification error of each chip detected by the die-by-die alignment system. The dynamic variation in the total overlay error is also small, and the overall alignment accuracy is fairly compatible with the preliminary overlay budget.

Citation Download Citation

Shinichiro Nohdo, Tomonori Motohashi, Nobuo Shimazu, Hiroyuki Nakano, Shinji Omori, Tetsuya Kitagawa, and Shigeru Moriya "Alignment accuracy of LEEPL: image placement error correction", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504067

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available