Shigeru Moriya
at Sony Corp
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 6 May 2005 Paper
S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733
KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

Proceedings Article | 20 August 2004 Paper
Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822
KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

SPIE Journal Paper | 1 July 2004
Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa
JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

Proceedings Article | 20 May 2004 Paper
Masaki Yoshizawa, Kazuya Iwase, Hiizu Ohtorii, Kumiko Oguni, Hiroki Hane, Keiko Amai, Shigeru Moriya, Hiroyuki Nakano, Tetsuya Kitagawa
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536029
KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Edge roughness, Electrons, Scanning electron microscopy, Scattering, Semiconducting wafers, Lithography, Image enhancement

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423
KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

Showing 5 of 15 publications
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