Mr. Shinichiro Nohdo Profile

Shinichiro Nohdo

at Sony Corp

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Author

Publications (7)

Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 20 August 2004 Paper

Feedforward correction of mask image placement for proximity electron lithography

Shinji Omori, Shinichiro Nohdo, Tomonori Motohashi, Tetsuya Kitagawa, Takashi Susa, Kenta Yotsui, Kojiro Itoh, Akira Tamura

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557821

KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Metrology, Lithography, Distortion, Scanners, Data corrections, Electron beams, Data processing

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 17 December 2003 Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

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Proceedings Article | 28 August 2003 Paper

Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo, Tomonori Motohashi, Nobuo Shimazu, Hiroyuki Nakano, Shinji Omori, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504067

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Optical alignment, Distortion, Overlay metrology, Resolution enhancement technologies, Silicon carbide, Cadmium sulfide

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Proceedings Article | 16 June 2003 Paper

Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node

Hiroyuki Nakano, Shinichiro Nohdo, Kumiko Oguni, Tomonori Motohashi, Masaki Yoshizawa, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484429

KEYWORDS: Charged-particle lithography, Lithography, Photoresist processing, Electron beam lithography, Image resolution, Silicon, Oxides, Electron beams, Chemically amplified resists, Photomasks

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Proceedings Article | 1 August 2002 Paper

Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node

Hiroyuki Nakano, Kumiko Oguni, Shinichiro Nohdo, Kaoru Koike, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476996

KEYWORDS: Photomasks, Charged-particle lithography, Optical alignment, Lithography, Semiconducting wafers, Electron beam lithography, Projection lithography, Photoresist processing, Etching, Dry etching

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Showing 5 of 7 publications

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