Eric Long Ma
Sr. Manager at ASML
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 20 March 2020 Paper
Eric Ma, Weiming Ren, Xinan Luo, Shuo Zhao, Xuerang Hu, Xuedong Liu, Chiyan Kuan, Kevin Chou, Martijn Maassen, Weihua Yin, Aiden Chen, Niladri Sen, Martin Ebert, Lei Liu, Fei Wang, Oliver Patterson
Proceedings Volume 11325, 113250F (2020) https://doi.org/10.1117/12.2553556
KEYWORDS: Inspection, Semiconducting wafers, Electrons, Optical inspection, Defect detection, System integration, Defect inspection, Image processing, Image quality standards, Semiconductor manufacturing

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770D (2019) https://doi.org/10.1117/12.2536565
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Electron beams, Defect inspection, Optical inspection, Signal detection, Sensors, Computer architecture, Defect detection

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109591R (2019) https://doi.org/10.1117/12.2515272
KEYWORDS: Inspection, Defect detection, Optical inspection, Photomasks, Semiconducting wafers, Image quality, Extreme ultraviolet, Computing systems, Semiconductors, Semiconductor manufacturing

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10810, 1081014 (2018) https://doi.org/10.1117/12.2503857
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Defect inspection, Wafer inspection, Scanning electron microscopy, Computing systems, Extreme ultraviolet lithography

Proceedings Article | 13 March 2018 Presentation + Paper
Proceedings Volume 10585, 105851L (2018) https://doi.org/10.1117/12.2297283
KEYWORDS: Metrology, Overlay metrology, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Logic, Optical proximity correction, Lithography, Critical dimension metrology, Electron beams

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 1058535 (2018) https://doi.org/10.1117/12.2323183
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Image processing, Semiconducting wafers, Computing systems, Semiconductors, Image quality, Scanning electron microscopy

Proceedings Article | 8 November 2012 Paper
Takeya Shimomura, Shogo Narukawa, Tsukasa Abe, Tadahiko Takikawa, Naoya Hayashi, Fei Wang, Long Ma, Chia-Wen Lin, Yan Zhao, Chiyan Kuan, Jack Jau
Proceedings Volume 8522, 85220L (2012) https://doi.org/10.1117/12.976017
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Ruthenium, Extreme ultraviolet lithography, Semiconductors, Optical inspection, Reflectivity, Semiconducting wafers

Proceedings Article | 28 April 2011 Paper
Jennifer Fullam, Carol Boye, Theodorus Standaert, John Gaudiello, Derek Tomlinson, Hong Xiao, Wei Fang, Xu Zhang, Fei Wang, Long Ma, Yan Zhao, Jack Jau
Proceedings Volume 7971, 79710Y (2011) https://doi.org/10.1117/12.879910
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Inspection, Electron microscopes, Defect inspection, Data acquisition, Etching, Field effect transistors

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 79691B (2011) https://doi.org/10.1117/12.879565
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect detection, Lithography, Manufacturing, Particles, Electronic components, Opacity

Proceedings Article | 25 September 2010 Paper
Takeya Shimomura, Yuichi Inazuki, Tsukasa Abe, Tadahiko Takikawa, Hiroshi Mohri, Naoya Hayashi, Fei Wang, Long Ma, Yan Zhao, Chiyan Kuan, Hong Xiao, Jack Jau
Proceedings Volume 7823, 78232B (2010) https://doi.org/10.1117/12.868171
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Bridges, Opacity, Defect detection, Scanning electron microscopy, Optical inspection, Extreme ultraviolet lithography

Proceedings Article | 2 April 2010 Paper
Hyung-Seop Kim, Byoung-Ho Lee, Eric Ma, Fei Wang, Yan Zhao, Kenichi Kanai, Hong Xiao, Jack Jau
Proceedings Volume 7638, 76380L (2010) https://doi.org/10.1117/12.848066
KEYWORDS: Inspection, Critical dimension metrology, Reticles, Optical inspection, Semiconducting wafers, Defect inspection, Bridges, Wafer inspection, Finite element methods, Optical lithography

Proceedings Article | 11 December 2009 Paper
Hyung-Seop Kim, Yong Min Cho, Byoung-Ho Lee, Roland Yeh, Eric Ma, Fei Wang, Yan Zhao, Kenichi Kanai, Hong Xiao, Jack Jau
Proceedings Volume 7520, 75200J (2009) https://doi.org/10.1117/12.837103
KEYWORDS: Inspection, Reticles, Semiconducting wafers, Optical inspection, Bridges, Wafer inspection, Defect inspection, Finite element methods, Scanning electron microscopy, Optical lithography

Proceedings Article | 11 December 2009 Paper
Takeya Shimomura, Yuichi Inazuki, Abe Tsukasa, Tadahiko Takikawa, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi, Fei Wang, Long Ma, Yan Zhao, Chiyan Kuan, Hong Xiao, Jack Jau
Proceedings Volume 7520, 75201D (2009) https://doi.org/10.1117/12.837025
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Scanning electron microscopy, Defect detection, Opacity, Extreme ultraviolet lithography, Bridges, Silicon, Solids

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74880T (2009) https://doi.org/10.1117/12.834581
KEYWORDS: Inspection, Nanoimprint lithography, Photomasks, Quartz, Vestigial sideband modulation, Defect inspection, Image processing, Manufacturing, Electronic components, Beam shaping

Proceedings Article | 23 September 2009 Paper
Hong Xiao, Long Ma, Fei Wang, Yan Zhao, Jack Jau, Kosta Selinidis, Ecron Thompson, S. V. Sreenivasan, Douglas Resnick
Proceedings Volume 7488, 74881V (2009) https://doi.org/10.1117/12.833419
KEYWORDS: Inspection, Photomasks, Nanoimprint lithography, Electron beam lithography, Semiconducting wafers, Lithography, Defect inspection, Dysprosium, Scanning electron microscopy, Optical lithography

Proceedings Article | 23 March 2009 Paper
Hong Xiao, Long Ma, Yan Zhao, Jack Jau
Proceedings Volume 7272, 72721E (2009) https://doi.org/10.1117/12.813885
KEYWORDS: Inspection, Semiconducting wafers, Etching, Oxides, Transmission electron microscopy, Nickel, Defect inspection, Manufacturing, Field effect transistors, Silicon

Showing 5 of 16 publications
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