Heeyoung Go
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500B (2023) https://doi.org/10.1117/12.2687461
KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes, Optical lithography, Bridges, Scanning electron microscopy, Resistance, Photoresist materials, Extreme ultraviolet, Metals

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 1249404 (2023) https://doi.org/10.1117/12.2656415
KEYWORDS: Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Lithography, Optical lithography, Photoresist processing, EUV optics, Chemical composition, Semiconductors

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