Dr. Juan Andres Torres
Distinguished Engineer at Siemens EDA
SPIE Involvement:
Author | Instructor
Publications (65)

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124951V (2023) https://doi.org/10.1117/12.2661150
KEYWORDS: Data modeling, Semiconducting wafers, Metrology, Modeling, Machine learning, Fabrication, Data processing, Semiconductors, Process modeling, Deposition processes

Proceedings Article | 27 April 2023 Paper
Proceedings Volume 12496, 124963J (2023) https://doi.org/10.1117/12.2662880
KEYWORDS: Reliability, Semiconducting wafers, Data modeling, Manufacturing, Fabrication, Semiconductors, Industry, High volume manufacturing, Model-based design, Metrology

Proceedings Article | 26 May 2022 Paper
Proceedings Volume 12053, 120531B (2022) https://doi.org/10.1117/12.2614943
KEYWORDS: Process modeling, Process control, Metrology, Calibration, Semiconducting wafers, Neodymium, Error analysis, Control systems, Semiconductors, Machine learning

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116112D (2021) https://doi.org/10.1117/12.2588467
KEYWORDS: Metrology, Bridges, Manufacturing, Data modeling, Time metrology, Semiconducting wafers, Reticles, Internet, Design for manufacturability, Data integration

SPIE Journal Paper | 23 March 2018
JM3, Vol. 17, Issue 01, 013508, (March 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.013508
KEYWORDS: Directed self assembly, Connectors, Global Positioning System, Curium, Model-based design, Detection and tracking algorithms, Calibration, Monte Carlo methods, Data modeling, Failure analysis

Proceedings Article | 30 March 2017 Presentation + Paper
Proceedings Volume 10148, 101480B (2017) https://doi.org/10.1117/12.2258056
KEYWORDS: Optical lithography, Optical proximity correction, Directed self assembly, Resolution enhancement technologies, Etching, Monte Carlo methods, Photomasks, Manufacturing, Metals, Logic, Visualization, Error analysis, Solids

Proceedings Article | 21 March 2017 Paper
Proceedings Volume 10144, 1014414 (2017) https://doi.org/10.1117/12.2257314
KEYWORDS: Calibration, Printing, Resolution enhancement technologies, Monte Carlo methods, Lithography, Model-based design, Optimization (mathematics), Detection and tracking algorithms, Directed self assembly, Connectors, Photomasks, Optical lithography

Proceedings Article | 21 March 2017 Presentation + Paper
J. Andres Torres, Germain Fenger, Daman Khaira, Yuansheng Ma, Yuri Granik, Chris Kapral, Joydeep Mitra, Polina Krasnova, Dehia Ait-Ferhat
Proceedings Volume 10144, 101440E (2017) https://doi.org/10.1117/12.2264178
KEYWORDS: Electronic design automation, Photomasks, Polymers, Optical lithography, Design for manufacturing, Lithography, Epitaxy, Inspection, Directed self assembly, Manufacturing, Systems modeling, Visualization, Data modeling

Proceedings Article | 21 March 2017 Presentation + Paper
Proceedings Volume 10144, 101440G (2017) https://doi.org/10.1117/12.2257313
KEYWORDS: Directed self assembly, Optical lithography, Monte Carlo methods, Photomasks, Manufacturing, Lithography, Double patterning technology, Printing, Optics manufacturing, Chemical analysis, Global Positioning System, Resolution enhancement technologies, Composites

SPIE Journal Paper | 29 September 2016
JM3, Vol. 15, Issue 03, 031610, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031610
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Proceedings Article | 22 March 2016 Paper
Proceedings Volume 9777, 97770N (2016) https://doi.org/10.1117/12.2219505
KEYWORDS: Optical lithography, Semiconducting wafers, Lithography, Directed self assembly, Immersion lithography, Extreme ultraviolet, Optical resolution, Neck, Modulation, Photomasks, Lens design, Ions, Neodymium, Visualization, Code division multiplexing

SPIE Journal Paper | 11 September 2015
JM3, Vol. 14, Issue 03, 031216, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031216
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 942306 (2015) https://doi.org/10.1117/12.2085850
KEYWORDS: Photomasks, Optical proximity correction, Printing, Source mask optimization, Optical lithography, Neodymium, Visualization, Transmission electron microscopy, Dysprosium, Directed self assembly

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9427, 94270P (2015) https://doi.org/10.1117/12.2084776
KEYWORDS: Photomasks, Lithography, Electron beam lithography, Optical lithography, Directed self assembly, Manufacturing, Semiconductor manufacturing, Visualization, Annealing, Optics manufacturing

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 94220U (2015) https://doi.org/10.1117/12.2085946
KEYWORDS: SRAF, Photovoltaics, Extreme ultraviolet, Printing, Extreme ultraviolet lithography, Photomasks, Finite-difference time-domain method, Image quality, Metals, 3D modeling

Proceedings Article | 16 March 2015 Paper
J. Torres, Fan Jiang, Yuansheng Ma, Joerg Mellman, Kafai Lai, Ananthan Raghunathan, Yongan Xu, Chi-Chun Liu, Cheng Chi
Proceedings Volume 9422, 94220W (2015) https://doi.org/10.1117/12.2085959
KEYWORDS: Line edge roughness, Extreme ultraviolet, Polymethylmethacrylate, Picosecond phenomena, Lithography, Polymers, Directed self assembly, Monte Carlo methods, Visualization, Extreme ultraviolet lithography

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 92310T (2014) https://doi.org/10.1117/12.2065508
KEYWORDS: Optical lithography, Photomasks, Metals, Modulation, Lithography, Optical proximity correction, Monte Carlo methods, Printing, Phase shift keying, Directed self assembly

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 92310Q (2014) https://doi.org/10.1117/12.2065840
KEYWORDS: Data modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Neodymium, Mask making, Tolerancing, Directed self assembly

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 92351X (2014) https://doi.org/10.1117/12.2069188
KEYWORDS: Data modeling, Calibration, Photomasks, Monte Carlo methods, Double patterning technology, Ions, Cements, Metrology, Neodymium, Directed self assembly

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530R (2014) https://doi.org/10.1117/12.2045328
KEYWORDS: Monte Carlo methods, Manufacturing, Lithography, Metals, Photomasks, Optical lithography, Directed self assembly, Visualization, Polymers, Design for manufacturability

Proceedings Article | 29 March 2013 Paper
Marwah Shafee, Jea-Woo Park, Ara Aslyan, Andres Torres, Kareem Madkour, Wael ElManhawy
Proceedings Volume 8684, 86840O (2013) https://doi.org/10.1117/12.2011413
KEYWORDS: Detector arrays, Computer aided design, Detection and tracking algorithms, Lithography, Optical proximity correction, Visualization, Resolution enhancement technologies, Electroluminescence, Integrated circuits, Manufacturing

Proceedings Article | 15 March 2012 Paper
Juliann Opitz, Andres Torres, Ioana Graur, Wael Manhawy, Suniti Kanodia, Marwah Shafee, Sarah Mohamed, Ahmed Hassand, Jeanne Bickford
Proceedings Volume 8327, 832711 (2012) https://doi.org/10.1117/12.916431
KEYWORDS: Manufacturing, Photomasks, Optical lithography, Design for manufacturing, Double patterning technology, Lithography, Design for manufacturability, Visualization, Resolution enhancement technologies, Interfaces

Proceedings Article | 5 April 2011 Paper
K. Lai, M. Gabrani, D. Demaris, N. Casati, A. Torres, S. Sarkar, P. Strenski, S. Bagheri, D. Scarpazza, A. Rosenbluth, D. Melville, A. Wächter, J. Lee, V. Austel, M. Szeto-Millstone, K. Tian, F. Barahona, T. Inoue, M. Sakamoto
Proceedings Volume 7973, 797308 (2011) https://doi.org/10.1117/12.879787
KEYWORDS: Source mask optimization, Photomasks, Lithography, Standards development, Algorithm development, Resolution enhancement technologies, Diffraction, Visualization, Photovoltaics

Proceedings Article | 4 April 2011 Paper
Proceedings Volume 7974, 797407 (2011) https://doi.org/10.1117/12.878463
KEYWORDS: Calibration, Machine learning, Databases, Data modeling, Computer simulations, Pattern recognition, Process modeling, Model-based design, Standards development, Neural networks

Proceedings Article | 4 April 2011 Paper
Proceedings Volume 7974, 79740O (2011) https://doi.org/10.1117/12.877601
KEYWORDS: Lithography, Photomasks, Double patterning technology, Manufacturing, Dielectrics, Optical proximity correction, Image quality, Etching, Overlay metrology, Image processing

Proceedings Article | 23 September 2009 Paper
J. Andres Torres, Oberdan Otto, Fedor Pikus
Proceedings Volume 7488, 74882A (2009) https://doi.org/10.1117/12.831047
KEYWORDS: Modulation transfer functions, Resolution enhancement technologies, Diffraction, Optical proximity correction, Chemical elements, Source mask optimization, Extreme ultraviolet, Process control, Coherence (optics), Image resolution

Proceedings Article | 13 March 2009 Paper
J. Andres Torres, Mark Hofmann, Oberdan Otto
Proceedings Volume 7275, 72750N (2009) https://doi.org/10.1117/12.813421
KEYWORDS: Optical proximity correction, Calibration, Manufacturing, Convolution, Photomasks, Data modeling, Computer simulations, SRAF, Design for manufacturing, Process modeling

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 72751A (2009) https://doi.org/10.1117/12.814367
KEYWORDS: Optical proximity correction, Manufacturing, Clocks, Critical dimension metrology, Ions, Picosecond phenomena, Design for manufacturing, Digital electronics, Yield improvement, Logic

Proceedings Article | 13 March 2009 Paper
Eitan Shauly, Andres Torres, Loran Friedrich, Moran Cohen-Yasour, Ovadya Menadeva, Fedor Pikus
Proceedings Volume 7275, 727519 (2009) https://doi.org/10.1117/12.814361
KEYWORDS: Transistors, Device simulation, Calibration, Semiconducting wafers, Ions, Instrument modeling, Data modeling, Process modeling, Manufacturing, Electrochemical etching

Proceedings Article | 13 March 2009 Paper
Jen-Yi Wuu, Fedor Pikus, Andres Torres, Malgorzata Marek-Sadowska
Proceedings Volume 7275, 727515 (2009) https://doi.org/10.1117/12.814316
KEYWORDS: Lithography, Computer programming, Data modeling, Optics manufacturing, Resolution enhancement technologies, Manufacturing, Model-based design, Library classification systems, Visualization, Optical lithography

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71223R (2008) https://doi.org/10.1117/12.801144
KEYWORDS: Design for manufacturing, Manufacturing, Photoresist processing, Yield improvement, Integrated circuits, Metals, Lithography, Visualization, Optimization (mathematics), Design for manufacturability

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71220S (2008) https://doi.org/10.1117/12.801381
KEYWORDS: Double patterning technology, Photomasks, Resolution enhancement technologies, Optical proximity correction, Optical lithography, Logic, Photoresist processing, Etching, Computer aided design, Silicon

Proceedings Article | 4 March 2008 Paper
Proceedings Volume 6925, 692509 (2008) https://doi.org/10.1117/12.769287
KEYWORDS: Metals, Manufacturing, Optical proximity correction, Lithography, Resolution enhancement technologies, Photomasks, Double patterning technology, Model-based design, Process modeling, Semiconductors

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67300U (2007) https://doi.org/10.1117/12.746700
KEYWORDS: Optical proximity correction, Photomasks, Process modeling, Error analysis, Metals, Data modeling, Manufacturing, Model-based design, Lithography, Data processing

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67300Y (2007) https://doi.org/10.1117/12.746722
KEYWORDS: Design for manufacturing, Lithography, Failure analysis, Yield improvement, Composites, Manufacturing, Metals, Particles, Chemical mechanical planarization, Materials processing

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 65210O (2007) https://doi.org/10.1117/12.711723
KEYWORDS: Lithography, Oscillators, Semiconducting wafers, Transistors, Visualization, Design for manufacturing, Integrated circuit design, Silicon, Process modeling, Etching

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 652108 (2007) https://doi.org/10.1117/12.711619
KEYWORDS: Design for manufacturing, Manufacturing, Lithography, Failure analysis, Metals, Composites, Resolution enhancement technologies, Data processing, Statistical analysis, Design for manufacturability

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63494X (2006) https://doi.org/10.1117/12.686604
KEYWORDS: Computer aided design, Manufacturing, Lithography, Visualization, Optical proximity correction, Metals, Distance measurement, Photomasks, Optics manufacturing, Silicon

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63491C (2006) https://doi.org/10.1117/12.686313
KEYWORDS: Lithography, Image processing, Standards development, Photovoltaics, Capacitors, Visualization, Manufacturing, Silicon, Semiconducting wafers, Design for manufacturing

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6151, 61513L (2006) https://doi.org/10.1117/12.666922
KEYWORDS: Photomasks, Phase shifts, Polymers, Lithography, Picosecond phenomena, Phase shifting, Etching, Polymethylmethacrylate, Photoresist processing, Directed self assembly

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 599232 (2005) https://doi.org/10.1117/12.632371
KEYWORDS: Optical proximity correction, Polarization, Lithographic illumination, Lithography, Visualization, Immersion lithography, Fiber optic illuminators, Optical design, Scanners, Data modeling

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59923L (2005) https://doi.org/10.1117/12.630024
KEYWORDS: Process modeling, Photomasks, Computer simulations, Model-based design, Distributed computing, Lithography, Resolution enhancement technologies, Visualization, Image processing, Calibration

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59921Y (2005) https://doi.org/10.1117/12.632345
KEYWORDS: SRAF, Photomasks, Model-based design, Source mask optimization, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Lithography, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600843
KEYWORDS: Photomasks, Optical proximity correction, Reticles, Data modeling, Logic, Scanners, Optical lithography, Calibration, Semiconducting wafers, Oscillators

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598848
KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Lithography, Distortion, Lithographic illumination, Image processing, Semiconducting wafers, Phase shifting, Model-based design

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599889
KEYWORDS: Process modeling, Lithography, Data modeling, Calibration, Resolution enhancement technologies, Error analysis, Semiconducting wafers, Photoresist processing, Optical proximity correction, Wafer-level optics

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601756
KEYWORDS: Photomasks, Lithography, Monte Carlo methods, Critical dimension metrology, Optical proximity correction, Polarization, Lithographic illumination, Optical lithography, SRAF, Nanoimprint lithography

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.598059
KEYWORDS: Optical proximity correction, Manufacturing, Critical dimension metrology, Control systems, Tolerancing, Metals, Reticles, Optical lithography, Lithography, Line edge roughness

Proceedings Article | 5 May 2005 Paper
J. Torres, C. Berglund
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.599044
KEYWORDS: Manufacturing, Process modeling, Design for manufacturability, Design for manufacturing, Lithography, Resolution enhancement technologies, Integrated circuits, Optical proximity correction, Distance measurement, Image processing

Proceedings Article | 27 January 2005 Paper
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577609
KEYWORDS: Printing, Photomasks, Calibration, Lithography, Optical proximity correction, Scanning electron microscopy, Logic, Image processing, Data modeling, Process modeling

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568576
KEYWORDS: Photomasks, Resolution enhancement technologies, Optical proximity correction, Logic, Optimization (mathematics), Manufacturing, SRAF, Visualization, Image quality, Control systems

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568354
KEYWORDS: Process modeling, Calibration, Data modeling, Metrology, TCAD, Optical proximity correction, Design for manufacturing, Resolution enhancement technologies, Process control, Photoresist processing

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534123
KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Photoresist processing, Image processing, Metrology, Thin films, Image acquisition, Error analysis

Proceedings Article | 10 July 2003 Paper
Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485421
KEYWORDS: Data modeling, Scattering, Optical proximity correction, SRAF, Calibration, Reticles, Scanning electron microscopy, Process modeling, Image processing, Lithography

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485357
KEYWORDS: Polarization, Data modeling, Diffraction, Optical proximity correction, Monochromatic aberrations, Systems modeling, Photomasks, Visualization, Thin films, Image acquisition

SPIE Journal Paper | 1 April 2003
JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1562931
KEYWORDS: Resolution enhancement technologies, Optical proximity correction, SRAF, Model-based design, Lithography, Image processing, Photomasks, Inspection, Solids, Scattering

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467782
KEYWORDS: Photomasks, SRAF, Optical proximity correction, Lithography, Resolution enhancement technologies, Phase shifts, Binary data, Manufacturing, Nanoimprint lithography, Lithographic illumination

Proceedings Article | 16 August 2002 Paper
Vicky Philipsen, Rik Jonckheere, Stephanie Kohlpoth, Christoph Friedrich, Juan Andres Torres
Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479336
KEYWORDS: Reticles, Optical proximity correction, Photomasks, Scanning electron microscopy, Phase shifts, Opacity, Semiconducting wafers, Printing, Particles, Inspection

Proceedings Article | 1 August 2002 Paper
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476978
KEYWORDS: Reticles, Printing, Chromium, Phase shifts, Opacity, Scanning electron microscopy, Semiconducting wafers, 193nm lithography, Inspection, Photomasks

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474589
KEYWORDS: Optical proximity correction, Model-based design, Image processing, Systems modeling, Feature extraction, Visualization, Optical lithography, Photomasks, Resolution enhancement technologies

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474537
KEYWORDS: SRAF, Optical proximity correction, Solids, Manufacturing, Resolution enhancement technologies, Inspection, Visualization, Scattering, Image processing, Optics manufacturing

Proceedings Article | 12 July 2002 Paper
Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475695
KEYWORDS: Manufacturing, Photomasks, Optical proximity correction, Lithography, Data modeling, Optics manufacturing, Image acquisition, Resolution enhancement technologies, Image processing, Lithographic illumination

Proceedings Article | 12 July 2002 Paper
Juan Andres Torres, David Chow, Paul de Dood, Daniel Albers
Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475688
KEYWORDS: Resolution enhancement technologies, SRAF, Phase shifts, Manufacturing, Standards development, Image processing, Optical proximity correction, Image enhancement, Photomasks, Feature extraction

Proceedings Article | 26 April 2001 Paper
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425215
KEYWORDS: Atrial fibrillation, Electroluminescence, Lithographic illumination, Printing, Reticles, Lithography, Optical lithography, Photomasks, Manufacturing, Cadmium

Proceedings Article | 18 August 2000 Paper
Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395751
KEYWORDS: Optical proximity correction, Design for manufacturability, Optics manufacturing, Critical dimension metrology, Image enhancement, Geometrical optics, Fiber optic illuminators, Error analysis, Statistical analysis, Image classification

Showing 5 of 65 publications
Conference Committee Involvement (2)
ICCAD
3 November 2014 |
Design Automation Conference
1 June 2014 |
Course Instructor
SC1101: Understanding Design-Patterning Interactions
This course explains how layout and circuit design interact with lithography choices. We especially focus on multi-patterning technologies such as LELE double patterning and SADP. We will explore role of design in lithography technology development as well as in lithographic process control. We will further discuss design enablement of multi-patterning technologies, especially in context of cell-based digital designs.
SC1187: Understanding Design-Patterning Interactions for EUV and DSA
EUV lithography and DSA haven been accepted by the industry as most promising candidates for dimensional scaling enablement at N7 technology node and beyond. This tutorial explains how introduction of such lithography technologies going to impact layout and circuit design. Choices of lithography would impact physical design and have a significant impact at system level. This tutorial will focus on transition from 193i multi-patterning technologies to EUV lithography and DSA. Factors that would determine on the enablement of these technologies would be highlighted and possible solutions would be shared.
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