Dr. Roman Chalyck Profile

Dr. Roman Chalyck

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 24 March 2017 Open Access

Progress in EUV lithography toward manufacturing

Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam

Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

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Proceedings Article | 18 March 2016 Paper

Study of nanometer-thick graphite film for high-power EUVL pellicle

Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, Ji-Beom Yoo

Proceedings Volume 9776, 97761Z (2016) https://doi.org/10.1117/12.2218228

KEYWORDS: Extreme ultraviolet lithography, Pellicles, Silicon, Extreme ultraviolet, Graphene, Crystals, Transmittance, Silicon films, Thin films, Lithography, Hydrogen, Infrared lasers, Thermography

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Proceedings Article | 1 April 2013 Paper

Effects of multilayer period on EUVL imaging for 2X node and beyond

Su-Young Lee, Hwan-Seok Seo, Tae-Geun Kim, Sang-Hyun Kim, Roman Chalykh, Seong-Sue Kim, Chan-Uk Jeon

Proceedings Volume 8679, 867903 (2013) https://doi.org/10.1117/12.2011076

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Cadmium, Neodymium, Ions, Wafer-level optics

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Proceedings Article | 7 March 2008 Paper

Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity

Irina Pundaleva, Roman Chalykh, MyoungSoo Lee, HeeBom Kim, ByungGook Kim, HanKu Cho

Proceedings Volume 6924, 69244H (2008) https://doi.org/10.1117/12.773203

KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Quartz, Distortion, Transmittance, Femtosecond phenomena, Refractive index, Binary data, Pulsed laser operation

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Proceedings Article | 12 May 2007 Paper

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Irina Pundaleva, Roman Chalykh, Heebom Kim, Byunggook Kim, Hanku Cho

Proceedings Volume 6607, 66070S (2007) https://doi.org/10.1117/12.728942

KEYWORDS: Scatterometry, 3D metrology, Extreme ultraviolet, Photomasks, Diffraction, Scatter measurement, Polarization, Metrology, Extreme ultraviolet lithography, Shape analysis

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Proceedings Article | 5 April 2007 Paper

Overlay metrology for dark hard mask process: simulation and experiment study

Jangho Shin, Roman Chalykh, Hyunjae Kang, SeongSue Kim, SukJoo Lee, Han-Ku Cho

Proceedings Volume 6518, 65182U (2007) https://doi.org/10.1117/12.711389

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Optical alignment, Image processing, Photoresist materials, Semiconductors, Image quality, Scanners, Lithography

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Proceedings Article | 5 April 2007 Paper

Image analysis of alignment and overlay marks with compound structure

Roman Chalykh, Irina Pundaleva, Jang-Ho Shin, Seong-Sue Kim, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6518, 65182D (2007) https://doi.org/10.1117/12.711277

KEYWORDS: Overlay metrology, Optical alignment, Antireflective coatings, Image analysis, Coating, Semiconductors, Image quality, Finite-difference time-domain method, Optical lithography, Semiconducting wafers

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Proceedings Article | 5 April 2007 Paper

Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes

Irina Pundaleva, Roman Chalykh, JeungWoo Lee, SeongWoon Choi, Woosung Han

Proceedings Volume 6518, 65180V (2007) https://doi.org/10.1117/12.711233

KEYWORDS: Critical dimension metrology, Scatterometry, Scatter measurement, Precision measurement, Polarization, Cadmium, Finite-difference time-domain method, Photomasks, Process control, Diffraction

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Proceedings Article | 20 October 2006 Paper

Simulation of critical dimension and profile metrology based on scatterometry method

Roman Chalykh, Irina Pundaleva, SeongSue Kim, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6349, 63491K (2006) https://doi.org/10.1117/12.688623

KEYWORDS: Critical dimension metrology, Scatterometry, Polarization, Diffraction, Diffraction gratings, Metrology, Scatter measurement, Overlay metrology, Magnetism, Light scattering

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Proceedings Article | 23 March 2006 Paper

Defect inspection of EUV mask blank using confocal microscopy: simulation and experiment

Seong-Sue Kim, Jinhong Park, Roman Chalykh, Jiehun Kang, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6151, 61511C (2006) https://doi.org/10.1117/12.656221

KEYWORDS: Confocal microscopy, Photomasks, Extreme ultraviolet, Smoothing, Defect inspection, Microscopes, Data modeling, Molybdenum, Silicon, Extreme ultraviolet lithography

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Proceedings Article | 10 May 2005 Paper

Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Roman Chalykh, Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601142

KEYWORDS: Optical alignment, Diffraction, Diffraction gratings, Overlay metrology, Image quality, Silica, Finite-difference time-domain method, Near field, Extreme ultraviolet, Signal processing

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Proceedings Article | 6 May 2005 Paper

Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Seong-Sue Kim, Roman Chalyck, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600459

KEYWORDS: Photomasks, Defect inspection, Extreme ultraviolet lithography, Confocal microscopy, Near field, Inspection, Fourier optics, Near field optics, Projection systems, Light sources

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Showing 5 of 12 publications

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