Mr. Toru Ikegami Profile

Toru Ikegami

at Hitachi High-Tech Corp

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Author

Publications (4)

Proceedings Article | 19 March 2015 Paper

Hybrid metrology implementation: server approach

Carmen Osorio, Padraig Timoney, Alok Vaid, Alex Elia, Charles Kang, Cornel Bozdog, Naren Yellai, Eyal Grubner, Toru Ikegami, Masahiko Ikeno

Proceedings Volume 9424, 94241H (2015) https://doi.org/10.1117/12.2087233

KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Reactive ion etching, Etching, Data processing, Data communications, Process control, Algorithm development

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Proceedings Article | 18 April 2013 Paper

Key points to measure accurately an ultra-low LER by using CD-SEM

Hiroki Kawada, Takahiro Kawasaki, Toru Ikegami, Norio Hasegawa, Kenichi Oyama, Hedetami Yaegashi

Proceedings Volume 8681, 86812N (2013) https://doi.org/10.1117/12.2013494

KEYWORDS: Line edge roughness, Scanning electron microscopy, Metrology, Line width roughness, Electron microscopes, Process control, Edge detection, Edge roughness, Extreme ultraviolet, Error analysis

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Proceedings Article | 4 April 2012 Paper

Hybrid metrology solution for 1X-node technology

Alok Vaid, Alexander Elia, Mark Kelling, John Allgair, Carsten Hartig, Peter Ebersbach, Erin McLellan, Matthew Sendelbach, Nedal Saleh, Narender Rana, Hiroki Kawada, Toru Ikegami, Masahiko Ikeno, Takahiro Kawasaki, Cornel Bozdog, Helen Kim, Elad Arnon, Roy Koret, Igor Turovets

Proceedings Volume 8324, 832404 (2012) https://doi.org/10.1117/12.916940

KEYWORDS: Line edge roughness, Scatterometry, Data modeling, Metrology, Critical dimension metrology, Metals, Semiconducting wafers, Extreme ultraviolet, Scatter measurement

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Proceedings Article | 24 March 2009 Paper

High-precision CD matching monitoring technology using profile gradient method for the 32-nm technology generation

Toru Ikegami, Akemi Kono, Tatsuya Maeda, Mayuka Osaki, Chie Shishido

Proceedings Volume 7272, 72722N (2009) https://doi.org/10.1117/12.813968

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Semiconductors, Image resolution, Electron beams, Contamination, Metrology, Electron microscopes, Optical alignment

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