Mr. Kenta Yotsui Profile

Kenta Yotsui

at Toppan Printing Co Ltd

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 28 June 2005 Paper

Image placement of large window-size membrane for EPL and LEEPL mask

Hideyuki Eguchi, Tomoya Sumida, Takashi Susa, Yoshiyuki Negishi, Toshiaki Kurosu, Takashi Yoshii, Tsukasa Yamazaki, Kenta Yotsui, Hiroshi Sugimura, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617287

KEYWORDS: Photomasks, Charged-particle lithography, Electron beam lithography, Projection lithography, Microelectromechanical systems, Solids

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Proceedings Article | 6 December 2004 Paper

Practical LEEPL masks for sub-65-nm node

Kenta Yotsui, Tomoya Sumida, Yoshiyuki Negishi, Takashi Yoshii, Kojiro Itoh, Akira Tamura

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570353

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Defect inspection, Silicon, Defect detection, Semiconducting wafers, Scanning electron microscopy, Etching, X-rays

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Proceedings Article | 6 December 2004 Paper

Global image placement of LEEPL mask

Hideyuki Eguchi, Takashi Susa, Tomoya Sumida, Toshiaki Kurosu, Takashi Yoshii, Kenta Yotsui, Hiroshi Sugimura, Kojiro Itoh, Akira Tamura

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578655

KEYWORDS: Photomasks, Charged-particle lithography, Distortion, Photovoltaics, Photomask technology, Silicon, Projection lithography

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Proceedings Article | 20 August 2004 Paper

Feedforward correction of mask image placement for proximity electron lithography

Shinji Omori, Shinichiro Nohdo, Tomonori Motohashi, Tetsuya Kitagawa, Takashi Susa, Kenta Yotsui, Kojiro Itoh, Akira Tamura

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557821

KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Metrology, Lithography, Distortion, Scanners, Data corrections, Electron beams, Data processing

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Proceedings Article | 20 August 2004 Paper

A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822

KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

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Proceedings Article | 17 December 2003 Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

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Proceedings Article | 28 August 2003 Paper

LEEPL mask fabrication using SOI substrates

Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504250

KEYWORDS: Photomasks, Charged-particle lithography, Silicon, Critical dimension metrology, Mask making, Silicon carbide, Projection lithography, Distortion, Lithography, Analytical research

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Showing 5 of 7 publications

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