Dr. Michael Kocsis
Principle Engineer at Inpria Corp
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 10 April 2024 Presentation + Paper
Craig Needham, Ulrich Welling, Amrit Narasimhan, Peter De Schepper, Lauren McQuade, Michael Kocsis, Lawrence Melvin, Jason Stowers, Stephen Meyers
Proceedings Volume 12957, 129571B (2024) https://doi.org/10.1117/12.3010941
KEYWORDS: Data modeling, Calibration, Thermal modeling, Performance modeling, Simulations, Photoresist materials, Metal oxides, Line width roughness, Mathematical modeling, Lithography

Proceedings Article | 10 April 2024 Presentation + Paper
Sonia Castellanos, Peter De Schepper, Maireyee Bhattacharya, Jan Doise, Joren Wouters, Amrit Narasimhan, Brian Cardineau, Lauren McQuade, Craig Needham, Michael Kocsis, Kazuki Kasahara, Stephen Meyers
Proceedings Volume 12957, 1295707 (2024) https://doi.org/10.1117/12.3010921
KEYWORDS: Humidity, Extreme ultraviolet lithography, Critical dimension metrology, Printing, Contamination, Semiconducting wafers, Metal oxides, Image processing, Environmental sensing, Chemical analysis

Proceedings Article | 9 April 2024 Paper
Proceedings Volume 12957, 129571J (2024) https://doi.org/10.1117/12.3009767
KEYWORDS: Tunable filters, Metal oxides, Bridges, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Optical lithography, Defect inspection, Wafer inspection

Proceedings Article | 9 April 2024 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kayoko Cho, Hikari Tomori, Yuhei Kuwahara, Tomoya Onitsuka, Soichiro Okada, Shinichiro Kawakami, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu, Reiko Tsuzuki, Xiang Liu, Arame Thiam, Yannick Feurprier, Kathleen Nafus, Michael Carcasi, Lior Huli, Kanzo Kato, Alexandra Krawicz, Michael Kocsis, Peter De Schepper, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Bruno La Fontaine, Ryan Miyakawa, Chris Anderson, Patrick Naulleau
Proceedings Volume 12957, 1295705 (2024) https://doi.org/10.1117/12.3010207
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Tin, Lithography, Etching

Proceedings Article | 1 May 2023 Paper
Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Soichiro Okada, Seiji Fujimoto, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kayoko Cho, Xiang Liu, Kathleen Nafus, Michael Carcasi, Ankur Agarwal, Mark Somervell, Lior Huli, Kanzo Kato, Michael Kocsis, Peter De Schepper, Stephen Meyers, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Chris Anderson, Patrick Naulleau
Proceedings Volume 12498, 1249806 (2023) https://doi.org/10.1117/12.2655928
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Line edge roughness, Lithography, Etching

Showing 5 of 33 publications
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